Etnews reported that Samsung Electronics and SK Hynix have ordered a High-NA ultra-ultraviolet (EUV) exposure device
Dec 09, 2022| Etnews reported that Samsung Electronics and SK Hynix have ordered a High-NA ultra-ultraviolet (EUV) exposure device for the next generation of semiconductor equipment from lithography giant ASML. Following TSMC and Intel, Korean semiconductor manufacturers are also preparing to introduce equipment capable of the 2nm process. Competition for the most advanced processes is expected to intensify.
IT House understands that High-NA EUV equipment is more expensive than the EUV equipment currently in use, but it enables a one-time implementation of the ultra-fine process (single patterning), which can greatly increase productivity. As for Samsung Electronics, it is necessary to secure High-NA EUV devices for 2nm mass production in advance of 3nm mass production. Existing EUV equipment is estimated to cost between 200 billion won (about 1.008 billion yuan) and 300 billion won (about 1.512 billion yuan), while High-NA EUV equipment is estimated to cost 500 billion won (about 2.52 billion yuan).
